Resolution and DOF improvement through the use of square-shaped illumination
نویسندگان
چکیده
As optical lithography is pushed to smaller dimensions, methods of resolution enhancement are considered necessary. Illumination modification is getting a good deal of attention, through strong and weak off-axis methods. The shape of an illumination profile does not need to be circular, especially if X/Y feature orientation is considered. This paper describes the improvements in imaging that are possible through use of source shapes that have various degrees of square character. Applications are discussed and interaction with optical proximity correction (OPC), aberration, and other imaging factors are addressed.
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